| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist composition capable of suppressing development defects.SOLUTION: A photoresist composition comprises: [A] a polymer having a structural unit (I) including an acid-dissociable group; and [B] an acid generating agent including a compound expressed by a formula (1) below. In the formula (1), Ris a monovalent alicyclic hydrocarbon group having 3-20 carbon atoms. An aliphatic heterocycle may be condensed with a carbon ring of the alicyclic hydrocarbon group. X is **-(X-R')-X-. Xis *-COO- or -O-. Xis -COO- or -O-. R' is a divalent alicyclic hydrocarbon group having 3-20 carbon atoms. An aliphatic heterocycle may be condensed with a carbon ring of the alicyclic hydrocarbon group. n is 0 or 1. Ris a divalent straight chain hydrocarbon group having even number of carbon atoms or a divalent straight chain fluorination hydrocarbon group having even number of carbon atoms. Ris a hydrogen atom or a fluorine atom. |
