发明名称 Reactor device with removable deposition monitor
摘要 A reactor apparatus includes a first chamber coupled to a first source of vacuum, a monitor chamber isolated from the first chamber and coupled to a second source of vacuum, and at least one removable deposition monitor disposed in the monitor chamber.
申请公布号 US9567661(B2) 申请公布日期 2017.02.14
申请号 US201514935136 申请日期 2015.11.06
申请人 SUPERCONDUCTOR TECHNOLOGIES, INC. 发明人 Ruby Ward;Von Dessonneck Kurt;Moeckly Brian
分类号 C23C14/00;C23C14/50;C23C14/54;C23C14/24;C23C14/56 主分类号 C23C14/00
代理机构 Vista IP Law Group LLP 代理人 Vista IP Law Group LLP
主权项 1. A reactor apparatus comprising: a deposition chamber coupled to a first source of vacuum, the deposition chamber exposed to one or more evaporation sources; a monitor chamber isolated from the deposition chamber by a vacuum isolation valve and coupled to a second source of vacuum; a moveable face plate coupled to rails extending into an interior of the monitor chamber, the at least one removable deposition monitor disposed on the rails and oriented toward the vacuum isolation valve.
地址 Austin TX US