Mask alignment system for semiconductor processing

摘要

A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.

主权项

1. A mask alignment system comprising:
a mask frame having a plurality of frame alignment cavities formed therein; an ion implantation mask movably connected to the mask frame, the mask having a plurality of mask alignment cavities formed therein; and a platen having a plurality of mask alignment pins extending therefrom, the plurality of mask alignment pins configured to engage the mask alignment cavities, the platen further having a plurality of frame alignment pins extending therefrom, the plurality of frame alignment pins configured to engage the frame alignment cavities; wherein the mask is disposed between the mask frame and the platen and is configured to engage the platen.