发明名称 |
METAL-FREE CVD COATING OF GRAPHENE ON GLASS AND OTHER DIELECTRIC SUBSTRATES |
摘要 |
A catalyst-free CVD method for forming graphene. The method involves placing a substrate within a reaction chamber, heating the substrate to a temperature between 600° C. and 1100° C., and introducing a carbon precursor into the chamber to form a graphene layer on a surface of the substrate. The method does not use plasma or a metal catalyst to form the graphene. |
申请公布号 |
US2017037510(A1) |
申请公布日期 |
2017.02.09 |
申请号 |
US201615332562 |
申请日期 |
2016.10.24 |
申请人 |
Corning Incorporated |
发明人 |
Liu Xinyuan;Manley Robert George;Morena Robert Michael;Song Zhen |
分类号 |
C23C16/26;C03C17/22;C23C16/02;C23C16/44;C01B31/04;C04B41/85 |
主分类号 |
C23C16/26 |
代理机构 |
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代理人 |
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主权项 |
1. A graphene-coated substrate, comprising
a dielectric substrate; and a graphene layer formed in direct contact with a surface of the substrate, wherein the substrate comprises a glass, ceramic or glass-ceramic. |
地址 |
Corning NY US |