LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A lithographic apparatus comprising a reflector (15) to redirect a radiation beam e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system comprises a non-compensating actuator device (300) and a compensating actuator device (200) to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.

主权项

1. A positioning system for positioning an object, wherein the positioning system is configured to position the object in N degrees of freedom, wherein N is a positive integer, the positioning system comprising:
M actuator devices, each actuator device configured to apply a force to the object, and M being a positive integer greater than N, wherein at least one of the actuator devices is a compensating actuator device and at least one other of the actuator devices is a non-compensating actuator device; and a controller configured to control a compensating actuator device and a non-compensating actuator device wherein the controller is configured to control the compensating actuator device to compensate for parasitic forces of the non-compensating actuator device, wherein the compensating actuator device and the non-compensating actuator device are configured to apply a force to the object at the same point thereon.