发明名称 ADHESION DETECTING METHOD
摘要 An adhesion detecting method detects the degree of adhesion of a protective tape having an adhesive layer to a wafer having devices on the front side. A protective tape is attached to the front side of the wafer with the adhesive layer facing the wafer. The protective tape is then peeled from the front side of the wafer. An arbitrary specific region on the front side of the wafer is imaged to detect a first height difference of first unevenness. A corresponding region on the adhesive layer of the peeled protective tape is imaged to detect a second height difference of second unevenness formed on the adhesive layer. The first height difference and the second height difference are compared with each other to determine whether or not the second height difference falls within an allowable range with respect to the first height difference.
申请公布号 US2017040201(A1) 申请公布日期 2017.02.09
申请号 US201615219737 申请日期 2016.07.26
申请人 DISCO CORPORATION 发明人 Nakamura Masaru
分类号 H01L21/683;H01L21/66 主分类号 H01L21/683
代理机构 代理人
主权项 1. An adhesion detecting method for detecting the degree of adhesion of a protective tape having an adhesive layer to a wafer in attaching said protective tape to the front side of said wafer, a plurality of division lines being formed on the front side of said wafer to thereby define a plurality of separate regions where a plurality of devices are each formed, said adhesion detecting method comprising: a protective tape attaching step of attaching said protective tape to the front side of said wafer in the condition where said adhesive layer faces the front side of said wafer; a protective tape peeling step of peeling said protective tape from the front side of said wafer; a first height difference detecting step of imaging an arbitrary specific region on the front side of said wafer to detect a first height difference of first unevenness present on the front side of said wafer; a second height difference detecting step of imaging a corresponding region on said adhesive layer of said protective tape peeled from the front side of said wafer corresponding to said specific region to detect a second height difference of second unevenness formed on said adhesive layer by the transfer of said first unevenness from the front side of said wafer to said adhesive layer; and a determining step of comparing said first height difference and said second height difference with each other and determining whether or not said second height difference falls within an allowable range with respect to said first height difference, wherein when said second height difference falls within said allowable range, the degree of adhesion is determined to pass, whereas when said second height difference falls out of said allowable range, the degree of adhesion is determined to fail.
地址 Tokyo JP