发明名称 |
IMPRINTING TEMPLATE SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, IMPRINTING TEMPLATE SUBSTRATE MANUFACTURING APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS |
摘要 |
An imprinting template substrate has a protruded portion, and a protective layer on a side surface of the protruded portion, and having a contact angle higher with respect to a resist material than a contact angle of the protruded portion with respect to the resist material. Even when the template is pressed to the resist, the resist hardly adheres to the side surface of the template. An imprinting process using the present template forms a pattern on a semiconductor substrate and then a semiconductor apparatus is manufactured. |
申请公布号 |
US2017040161(A1) |
申请公布日期 |
2017.02.09 |
申请号 |
US201615066616 |
申请日期 |
2016.03.10 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
SATO Nobuyoshi |
分类号 |
H01L21/027;B29C59/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
1. An imprinting template substrate comprising:
a protruded portion; and a protective layer on a side surface of the protruded portion, and having a contact angle higher with respect to a resist material than a contact angle of the protruded portion with respect to the resist material. |
地址 |
Tokyo JP |