发明名称 IMPRINTING TEMPLATE SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, IMPRINTING TEMPLATE SUBSTRATE MANUFACTURING APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS
摘要 An imprinting template substrate has a protruded portion, and a protective layer on a side surface of the protruded portion, and having a contact angle higher with respect to a resist material than a contact angle of the protruded portion with respect to the resist material. Even when the template is pressed to the resist, the resist hardly adheres to the side surface of the template. An imprinting process using the present template forms a pattern on a semiconductor substrate and then a semiconductor apparatus is manufactured.
申请公布号 US2017040161(A1) 申请公布日期 2017.02.09
申请号 US201615066616 申请日期 2016.03.10
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SATO Nobuyoshi
分类号 H01L21/027;B29C59/00 主分类号 H01L21/027
代理机构 代理人
主权项 1. An imprinting template substrate comprising: a protruded portion; and a protective layer on a side surface of the protruded portion, and having a contact angle higher with respect to a resist material than a contact angle of the protruded portion with respect to the resist material.
地址 Tokyo JP