| 摘要 |
A charged particle beam writing apparatus according to one aspect of the present invention includes a calculation unit to calculate a dose density that corrects a dimensional variation caused by at least one of a proximity effect, a fogging effect, and a loading effect, and indicates a dose per unit area of a charged particle beam, where the dose density has been modulated based on a dose modulation amount input from outside, a determination unit to determine whether the dose density exceeds an acceptable value, and a writing unit to write a pattern on a target object with the charged particle beam. |
