发明名称 Amorphous oxide and thin film transistor
摘要 The present invention relates to an amorphous oxide and a thin film transistor using the amorphous oxide. In particular, the present invention provides an amorphous oxide having an electron carrier concentration less than 10 18 /cm 3 , and a thin film transistor using such an amorphous oxide. In a thin film transistor having a source electrode 6, a drain electrode 5, a gate electrode 4, a gate insulating film 3, and a channel layer 2, an amorphous oxide having an electron carrier concentration less than 10 18 /cm 3 is used in the channel layer 2.
申请公布号 EP2226847(B1) 申请公布日期 2017.02.08
申请号 EP20100006629 申请日期 2005.02.28
申请人 Japan Science and Technology Agency 发明人 Hosono, Hideo;Hirano, Masahiro;Ota, Hiromichi;Kamiya, Toshio;Nomura, Kenji
分类号 C23C14/00;C23C14/08;C23C14/28;C23C14/34;G02F1/1345;G02F1/1368;H01L21/02;H01L21/363;H01L21/77;H01L21/84;H01L27/12;H01L29/786 主分类号 C23C14/00
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