发明名称 |
EUV LIGHT MULTI-LAYER MIRROR |
摘要 |
In order to make it possible to suppress breakage in a mirror that reflects EUV light having high light intensity, this EUV light multi-layer mirror has a Bragg diffraction effect and is formed by alternately stacking a plurality of heavy-element layers (102) and light-element layers (103) on a substrate (101). The heavy-element layers (102) have niobium as a main component, and the light-element layers (103) have silicon as a main component. For instance, heavy-element layers (102) composed of niobium and light-element layers (103) composed of silicon are alternately stacked on a substrate (101) composed of single-crystal silicon. |
申请公布号 |
WO2017018293(A1) |
申请公布日期 |
2017.02.02 |
申请号 |
WO2016JP71255 |
申请日期 |
2016.07.20 |
申请人 |
NTT ADVANCED TECHNOLOGY CORPORATION |
发明人 |
ICHIMARU,Satoshi;HATAYAMA,Masatoshi;NISHIKINO,Masaharu;ISHINO,Masahiko |
分类号 |
G02B5/28;G02B5/08;G02B5/26;G21K1/00;G21K1/06 |
主分类号 |
G02B5/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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