发明名称 EUV LIGHT MULTI-LAYER MIRROR
摘要 In order to make it possible to suppress breakage in a mirror that reflects EUV light having high light intensity, this EUV light multi-layer mirror has a Bragg diffraction effect and is formed by alternately stacking a plurality of heavy-element layers (102) and light-element layers (103) on a substrate (101). The heavy-element layers (102) have niobium as a main component, and the light-element layers (103) have silicon as a main component. For instance, heavy-element layers (102) composed of niobium and light-element layers (103) composed of silicon are alternately stacked on a substrate (101) composed of single-crystal silicon.
申请公布号 WO2017018293(A1) 申请公布日期 2017.02.02
申请号 WO2016JP71255 申请日期 2016.07.20
申请人 NTT ADVANCED TECHNOLOGY CORPORATION 发明人 ICHIMARU,Satoshi;HATAYAMA,Masatoshi;NISHIKINO,Masaharu;ISHINO,Masahiko
分类号 G02B5/28;G02B5/08;G02B5/26;G21K1/00;G21K1/06 主分类号 G02B5/28
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