| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for photocurable nanoimprint having excellent etching resistance of chlorine gas and excellent productivity, and to provide a composition for photocurable nanoimprint which facilitates transfer of a pattern even when a die is pressed with a relatively low pressure, and ensures excellent nanoimprint pattern transferability, e.g., excellent adhesion of the pattern to a substrate, and excellent releasability from a die.SOLUTION: The composition for photocurable nanoimprint contains (A) a hydrolysis mixture of a hydrolysate of an organic silicon compound having a (meth)acryl group, and a hydrolysate of a specific metal alkoxide, (B) a polymerizable monomer having a (meth)acryl group, and (C) a photopolymerization initiator. A hydrolysate of an organic silicon compound may be added to the hydrolysis mixture of (A). |
