Exposure apparatus and method of manufacturing article

摘要

The present invention provides an exposure apparatus which exposes each of a plurality of shot regions on a substrate, comprising a substrate stage configured to be movable while holding the substrate, and a control unit, wherein the plurality of shot regions include a first shot region, and a second shot region which is exposed next to the first shot region, and the control unit drives the substrate stage in accordance with drive information of the substrate stage in a period until exposure of the second shot region starts after an end of exposing the first shot region, and when an exposure condition for exposing the second shot region is not satisfied in the period, the control unit drives again the substrate stage in accordance with the drive information and then exposes the second shot region.

主权项

1. An exposure apparatus which exposes each of a first shot region and a second shot region on a substrate, comprising:
a substrate stage configured to be movable while holding the substrate; a projection optical system configured to project, onto the substrate, a pattern formed on a mask; and a control unit configured to perform control of driving the substrate stage after exposing the first shot region, and then exposing the second shot region in a state where an exposure condition for exposing the second shot region is satisfied, wherein the control unit controls exposing the second shot region while correcting a state of a pattern image, which is projected on the substrate by the projection optical system, in accordance with a correction value obtained in advance by driving the substrate stage based on acceleration information of the substrate stage in a direction perpendicular to an optical axis of the projection optical system, cancels exposing the second shot region in a case where the exposure condition is not satisfied while driving the substrate stage from an end position of exposing the first shot region to a start position of exposing the second shot region based on the acceleration information, and then performs exposing the second shot region in a state where the exposure condition is satisfied after driving again the substrate stage from the end position to the start position based on the acceleration information.