| 发明名称 | Color filter of illumination image sensor and method for fabricating the same | ||
| 摘要 | The invention provides a color filter of an illumination image sensor and a method for fabricating the same. A color filter of an illumination image sensor includes a light shield portion constructed by a plurality of grid photoresist patterns, wherein the light shield portion covers a back side surface of the silicon wafer in a periphery region of an illumination image sensor chip. | ||
| 申请公布号 | US9559137(B2) | 申请公布日期 | 2017.01.31 |
| 申请号 | US201012940756 | 申请日期 | 2010.11.05 |
| 申请人 | VISERA TECHNOLOGIES COMPANY LIMITED | 发明人 | Chen Hao-Min;Lu Chen-Wei;Chang Chih-Kung |
| 分类号 | H01L27/146 | 主分类号 | H01L27/146 |
| 代理机构 | Muncy, Geissler, Olds & Lowe, P.C. | 代理人 | Muncy, Geissler, Olds & Lowe, P.C. |
| 主权项 | 1. A color filter of an illumination image sensor, comprising: a light shield portion constructed by grid photoresist patterns, wherein the light shield portion covers a periphery region of an illumination image sensor chip, wherein the grid photoresist patterns are arranged in an array, and wherein the two adjacent grid photoresist patterns are separated from each other by a gap. | ||
| 地址 | Hsinchu Science Park TW | ||