发明名称 Semiconductor device
摘要 A semiconductor device includes a first electrode, a first insulating layer having a first opening reaching the first electrode and having a ring-shaped first side wall exposed to the first opening, an oxide semiconductor layer on the first side wall, the oxide semiconductor layer being connected with the first electrode, a gate insulating layer on the oxide semiconductor layer, the oxide semiconductor layer being between the first side wall and the gate insulating layer, a gate electrode facing the oxide semiconductor layer on the first side wall, the gate insulating layer being between the oxide semiconductor layer and the gate electrode, and a second electrode above the first insulating layer, the second electrode being connected with the oxide semiconductor layer.
申请公布号 US9559214(B2) 申请公布日期 2017.01.31
申请号 US201514950777 申请日期 2015.11.24
申请人 Japan Display Inc. 发明人 Sasaki Toshinari
分类号 H01L29/786;H01L29/417;H01L29/423;H01L29/66;H01L27/12 主分类号 H01L29/786
代理机构 TYPHA IP LLC 代理人 TYPHA IP LLC
主权项 1. A semiconductor device, comprising: a first electrode; a first insulating layer having a first opening reaching the first electrode and having a ring-shaped first side wall exposed to the first opening; an oxide semiconductor layer on the first side wall, the oxide semiconductor layer being connected with the first electrode; a gate insulating layer on the oxide semiconductor layer, the oxide semiconductor layer being between the first side wall and the gate insulating layer; a gate electrode facing the oxide semiconductor layer on the first side wall, the gate insulating layer being between the oxide semiconductor layer and the gate electrode; and a second electrode above the first insulating layer, the second electrode being connected with the oxide semiconductor layer; further comprising: a second insulating layer above the first electrode, the first insulating layer, the oxide semiconductor layer and the gate insulating layer; a fourth electrode connected with the first electrode; and a fifth electrode connected with the gate electrode; wherein: the fourth electrode is connected with the first electrode via a second opening in the second insulating layer; the second electrode is connected with the oxide semiconductor layer via a third opening in the second insulating layer; and the fifth electrode is connected with the gate electrode via a fourth opening in the second insulating layer.
地址 Tokyo JP
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