发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A highly reliable semiconductor device and a method for manufacturing the semiconductor device are provided. The semiconductor device is manufactured with a high yield, so that high productivity is achieved. In a semiconductor device including a transistor in which a source electrode layer and a drain electrode layer are provided over and in contact with an oxide semiconductor film, entry of impurities and formation of oxygen vacancies in an end face portion of the oxide semiconductor film are suppressed. This can prevent fluctuation in the electric characteristics of the transistor which is caused by formation of a parasitic channel in the end face portion of the oxide semiconductor film.
申请公布号 US2017025542(A1) 申请公布日期 2017.01.26
申请号 US201615286962 申请日期 2016.10.06
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 YAMAZAKI Shunpei;NAKASHIMA Motoki;TAKAHASHI Masahiro
分类号 H01L29/786;H01L29/06;H01L29/36;H01L29/24;H01L29/417;H01L29/423 主分类号 H01L29/786
代理机构 代理人
主权项 1. (canceled)
地址 Atsugi-shi JP