发明名称 Thyristor Volatile Random Access Memory and Methods of Manufacture
摘要 A volatile memory array using vertical thyristors is disclosed together with methods of fabricating the array.
申请公布号 US2017025414(A1) 申请公布日期 2017.01.26
申请号 US201615283085 申请日期 2016.09.30
申请人 Kilopass Technology, Inc. 发明人 Luan Harry;Bateman Bruce L.;Axelrad Valery;Cheng Charlie
分类号 H01L27/102;H01L21/762;H01L29/45;G11C11/39;H01L21/321;H01L29/06;H01L29/10;H01L29/749;H01L29/66;H01L21/28 主分类号 H01L27/102
代理机构 代理人
主权项 1. A method of making a volatile memory array having row lines, column lines, and an array of vertical thyristors having anodes coupled to one of the row and column lines and having cathodes coupled to the other of the row and column lines, the method comprising: introducing opposite conductivity type dopant into a first conductivity type semiconductor substrate to thereby provide a buried layer providing a cathode for each of the vertical thyristors; forming a first conductivity type epitaxial layer on the buried layer; removing all of the epitaxial layer and the buried layer to expose portions of the substrate from a first plurality of parallel regions extending in a first direction of the memory array to thereby form a first plurality of deep trenches; filling the first plurality of deep trenches with insulating material; removing all of the epitaxial layer to expose portions of the buried layer from a second plurality of parallel regions extending in a second direction of the memory array to thereby form a second plurality of shallow trenches; filling the second plurality of shallow trenches with insulating material; introducing opposite conductivity type dopant into an upper portion of the epitaxial layer to form upper opposite conductivity type regions separated from the buried layer by a lower portion of the epitaxial layer; and introducing first conductivity type dopant into a top portion of the upper opposite conductivity type regions to form an anode for each of the vertical thyristors.
地址 San Jose CA US