| 摘要 |
To provide an inspection device suitable for inspecting complex and minute patterns and defects and a method for controlling the same, provided are an inspection device and defect inspection method in which light emitted from a light source unit is irradiated onto a sample placed on a moving stage, scattered light from the sample irradiated by the light is detected by an image sensor while the timing of the detection is controlled, an image processing unit generates a sample pattern image from an output signal received by the image processing unit from the image sensor that detected the scattered light from the sample and detects a sample pattern defect from the generated image, and the results of the processing by the image processing unit are displayed on a screen, wherein a trigger signal for making the image sensor light reception time constant is generated and the scattered light from the sample is detected such that the generated trigger signal is used to carry out control so that the image sensor light reception time is constant. |
