METAL MASK SUBSTRATE FOR VAPOR DEPOSITION, METAL MASK FOR VAPOR DEPOSITION, PRODUCTION METHOD FOR METAL MASK SUBSTRATE FOR VAPOR DEPOSITION, AND PRODUCTION METHOD FOR METAL MASK FOR VAPOR DEPOSITION

摘要

A metal mask substrate (10) for vapor deposition includes a nickel-containing metal sheet (11) that is provided with a front surface and a back surface that is the opposite surface from the front surface. The front surface and/or the back surface serves as a target surface for positioning a resist layer. The surface roughness Sa of the target surface is no more than 0.019 μm, and the surface roughness Sz of the target surface is no more than 0.308 μm.