| 摘要 |
The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50. |
| 主权项 |
1. A drain cleaning composition consisting of:
(a) 4% to 12% by weight of a hypochlorite oxidizing agent; (b) 2.5% to 10% by weight of a hydroxide; (c) a charged surfactant comprising an anionic surfactant; and (d) an uncharged surfactant comprising one or more amine oxides; (e) water; (f) optionally, one or more adjuvants selected from the group consisting of: coloring agents, dyes, pigments, fragrances, opacifiers, corrosion inhibitors and any combinations thereof; wherein a ratio of charged surfactant to uncharged surfactant by weight is from 1:10 to 1:50; and the composition is viscoelastic and has a viscosity of at least 250 cP at 10/s, a zero-shear viscosity of at least 1000 cP at 25° C. and a critical shear rate of at least 1/sec. |
