发明名称 Semiconductor Device and Method of Manufacturing the Same
摘要 It is an object to form a buffer circuit, an inverter circuit, or the like using only n-channel TFTs including an oxide semiconductor layer. A buffer circuit, an inverter circuit, or the like is formed by combination of a first transistor in which a source electrode and a drain electrode each overlap with a gate electrode and a second transistor in which a source electrode overlaps with a gate electrode and a drain electrode does not overlap with the gate electrode. Since the second transistor has such a structure, the capacitance Cp can be small, and VA′ can be large even in the case where the potential difference VDD−VSS is small.
申请公布号 US2017025549(A1) 申请公布日期 2017.01.26
申请号 US201615284812 申请日期 2016.10.04
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 MIYAKE Hiroyuki
分类号 H01L29/786;H01L29/24;H03K19/017;H01L27/12 主分类号 H01L29/786
代理机构 代理人
主权项 1. (canceled)
地址 Kanagawa-ken JP