发明名称 基板処理方法、基板処理装置および記憶媒体
摘要 A substrate processing method and apparatus for preventing evaporation of an anti-drying fluorine-containing organic solvent from a substrate during transportation of the substrate into a processing container and can prevent decomposition of a fluorine-containing organic solvent in the processing container. A substrate, the surface of which is covered with a first fluorine-containing organic solvent, is carried into a processing container. The first fluorine-containing organic solvent is removed from the substrate surface by forming a high-pressure fluid atmosphere of a mixture of the first fluorine-containing organic solvent and a second fluorine-containing organic solvent, having a lower boiling point than the first fluorine-containing organic solvent, in the processing container e.g. by supplying a high-pressure fluid of the second fluorine-containing organic solvent into the processing container. Thereafter, a fluid in the state of a high-pressure fluid or a gas is discharged from the processing container to obtain the substrate in the dried state.
申请公布号 JP6068029(B2) 申请公布日期 2017.01.25
申请号 JP20120159850 申请日期 2012.07.18
申请人 株式会社東芝;東京エレクトロン株式会社 发明人 林 秀和;佐藤 洋平;大口 寿史;冨田 寛;光岡 一行;楊 元;大野 広基;折居 武彦;戸島 孝之
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
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