发明名称 |
Reference voltage generator having diode-connected depletion MOS transistors with same temperature coefficient |
摘要 |
A reference voltage generator has a first N type depletion MOS transistor configured to cause a constant current to flow, and a second N type depletion MOS transistor diode-connected to the first N type depletion MOS transistor and configured to generate a reference voltage based on the constant current. The first and second N type depletion MOS transistors have the same temperature coefficient of a threshold voltage. The first N type depletion MOS transistor has a buried channel into which arsenic impurities are diffused. The second N type depletion MOS transistor has a buried channel into which phosphorous impurities are diffused. |
申请公布号 |
US9552009(B2) |
申请公布日期 |
2017.01.24 |
申请号 |
US201414525890 |
申请日期 |
2014.10.28 |
申请人 |
SII Semiconductor Corporation |
发明人 |
Hashitani Masayuki;Yoshino Hideo |
分类号 |
G05F3/24;G05F3/16;G05F3/20 |
主分类号 |
G05F3/24 |
代理机构 |
Adams & Wilks |
代理人 |
Adams & Wilks |
主权项 |
1. A reference voltage generator, comprising:
a first N type depletion MOS transistor configured to cause a constant current to flow; and a second N type depletion MOS transistor that is diode-connected to the first N type depletion MOS transistor, has the same temperature coefficient of a threshold voltage as a temperature coefficient of a threshold voltage of the first N type depletion MOS transistor, and is configured to generate a reference voltage based on the constant current; wherein the second N type depletion MOS transistor has a buried channel into which phosphorous impurities are diffused, and the first N type depletion MOS transistor has a buried channel into which arsenic impurities are diffused. |
地址 |
JP |