摘要 |
Disclosed are processes of removing layers from substrates using fluorinated reactants having the formula MFx(adduct)n, wherein x ranges from 2 to 6 inclusive; n ranges from 0 to 5 inclusive; M is selected from the group consisting of P, Ti, Zr, Hf, V, Nb, Ta, Mo, and W; and the adduct is a neutral organic molecule selected from THF, dimethylether, diethylether, glyme, diglyme, triglyme, polyglyme, dimethylsulphide, diethylsulphide, or methylcyanide. The fluorinated reactants dry etch the nitride layers without utilizing any plasma. |
申请人 |
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;LANSALOT-MATRAS, Clément;LEE, Jooho;GIRARD, Jean-Marc;BLASCO, Nicolas;GATINEAU, Satoko |
发明人 |
LANSALOT-MATRAS, Clément;LEE, Jooho;GIRARD, Jean-Marc;BLASCO, Nicolas;GATINEAU, Satoko |