发明名称 REVIEW OF SUSPECTED DEFECTS USING ONE OR MORE REFERENCE DIES
摘要 A system for reviewing a wafer, the system may include a memory unit that is configured to store information about locations of a set of suspected defects that are located at multiple dice of the wafer; electron optics that is configured to obtain images of reference elements, wherein the reference elements are located within a first reference die of the wafer; and a processor that is configured to: compare the first sub-set of suspected defects to a first sub-set of reference elements to provide a first evaluation result; and select, in response to the first evaluation result, a source of a second sub-set of reference elements. The electron optics is further configured to obtain images of a second sub-set of reference elements that are located within a second reference die of the wafer when it is determined that the second reference die is the source of the second sub-set of reference elements. The processor is further configured to compare the second sub-set of suspected defects to the second sub-set of reference elements to provide a second evaluation result.
申请公布号 US2017018398(A1) 申请公布日期 2017.01.19
申请号 US201514798153 申请日期 2015.07.13
申请人 APPLIED MATERIALS ISRAEL LTD. 发明人 Greenberg Ofir;Gronau Yuval
分类号 H01J37/22;H01J37/28 主分类号 H01J37/22
代理机构 代理人
主权项 1. A system for reviewing a wafer, the system comprising: a memory unit configured to store information about locations of a set of suspected defects that are located at multiple dice of the wafer; electron optics configured to obtain images of reference elements located within a first reference die of the wafer; a processor configured to: compare a first sub-set of suspected defects to a first sub-set of reference elements to provide a first evaluation result; and select, in response to the first evaluation result, a source of a second sub-set of reference elements; wherein the electron optics are further configured to obtain images of a second sub-set of reference elements that are located within a second reference die of the wafer when it is determined that the second reference die is the source of the second sub-set of reference elements; and wherein the processor is further configured to compare a second sub-set of suspected defects to the second sub-set of reference elements to provide a second evaluation result.
地址 Rehovot IL