发明名称 Cosmetic use of N-heteroarylbisamide analogs and related compounds
摘要 Cosmetic and dermatological compositions comprising N-heteroarylbisamide analogs and methods of using such compositions to impart anti-aging benefits to the skin and/or improve skin conditions resulting from reduced collagen and hyaluronic acid production are disclosed. The N-heteroarylbisamides are believed to stimulate collagen and hyaluronic acid production and restore or maintain homeostasis for these compounds.
申请公布号 US9545367(B2) 申请公布日期 2017.01.17
申请号 US201514700661 申请日期 2015.04.30
申请人 AVON PRODUCTS, INC. 发明人 Parimoo Satish;Ilaya Nancy T.;Lyga John W.
分类号 A61K31/415;A61Q19/08;A61P17/02;A61K8/49;A61K9/00;A61Q19/00 主分类号 A61K31/415
代理机构 Greenberg Traurig LLP 代理人 Ball Jonathan D.;Greenberg Traurig LLP
主权项 1. A method for improving the aesthetic appearance of human skin comprising topically applying to an area of the skin in need thereof an amount of a cosmetic composition comprising a cosmetically acceptable vehicle and a dermatologically effective amount of a N-heteroarylbisamide of formula I:where: Q is N or C; R, R2, R2, R3, R4 and R6 are independently H, C1-C8 alkyl, heteroalkyl, alkoxyalkyl, heteroalkoxyalkyl, C3-C8 cycloalkyl, heterocycloalkyl, aryl, heteroaryl, alkyl-aryl, heteroalkyl-aryl, aryl-alkyl, and/or heteroaryl-alkyl; and R1 and R5 are independently H, C1-C8 alkyl, heteroalkyl, alkoxyalkyl, heteroalkoxyalkyl, C3-C8 cycloalkyl, heterocycloalkyl, aryl, heteroaryl, alkyl-aryl, heteroalkyl-aryl, aryl-alkyl, and/or heteroaryl-alkyl or WR wherein W is CO, CO2, CONH, SO2, PO3, or CH(Oalkyl)2; and n is 3.
地址 New York NY US