发明名称 | Cosmetic use of N-heteroarylbisamide analogs and related compounds | ||
摘要 | Cosmetic and dermatological compositions comprising N-heteroarylbisamide analogs and methods of using such compositions to impart anti-aging benefits to the skin and/or improve skin conditions resulting from reduced collagen and hyaluronic acid production are disclosed. The N-heteroarylbisamides are believed to stimulate collagen and hyaluronic acid production and restore or maintain homeostasis for these compounds. | ||
申请公布号 | US9545367(B2) | 申请公布日期 | 2017.01.17 |
申请号 | US201514700661 | 申请日期 | 2015.04.30 |
申请人 | AVON PRODUCTS, INC. | 发明人 | Parimoo Satish;Ilaya Nancy T.;Lyga John W. |
分类号 | A61K31/415;A61Q19/08;A61P17/02;A61K8/49;A61K9/00;A61Q19/00 | 主分类号 | A61K31/415 |
代理机构 | Greenberg Traurig LLP | 代理人 | Ball Jonathan D.;Greenberg Traurig LLP |
主权项 | 1. A method for improving the aesthetic appearance of human skin comprising topically applying to an area of the skin in need thereof an amount of a cosmetic composition comprising a cosmetically acceptable vehicle and a dermatologically effective amount of a N-heteroarylbisamide of formula I:where: Q is N or C; R, R2, R2, R3, R4 and R6 are independently H, C1-C8 alkyl, heteroalkyl, alkoxyalkyl, heteroalkoxyalkyl, C3-C8 cycloalkyl, heterocycloalkyl, aryl, heteroaryl, alkyl-aryl, heteroalkyl-aryl, aryl-alkyl, and/or heteroaryl-alkyl; and R1 and R5 are independently H, C1-C8 alkyl, heteroalkyl, alkoxyalkyl, heteroalkoxyalkyl, C3-C8 cycloalkyl, heterocycloalkyl, aryl, heteroaryl, alkyl-aryl, heteroalkyl-aryl, aryl-alkyl, and/or heteroaryl-alkyl or WR wherein W is CO, CO2, CONH, SO2, PO3, or CH(Oalkyl)2; and n is 3. | ||
地址 | New York NY US |