发明名称 CROSS-HIERARCHY INTERCONNECT ADJUSTMENT FOR POWER RECOVERY
摘要 Embodiments relate to cross-hierarchy interconnect adjustment. An aspect includes receiving chip layout data corresponding to a chip design, wherein a first portion of a metal stack of the chip design is assigned to a first hierarchy and a second portion of the metal stack is assigned to a second hierarchy based on a contract between the first and second hierarchy. Another aspect includes determining an unused portion of the first portion of the metal stack. Another aspect includes moving an interconnect of the second hierarchy from the second portion of the metal stack that is assigned to the second hierarchy to the unused portion of the first portion of the metal stack in the chip layout data. Another aspect includes performing power recovery on the chip layout data after moving the interconnect based on an amount of slack margin generated in the chip design by the moving of the interconnect.
申请公布号 US2017011159(A1) 申请公布日期 2017.01.12
申请号 US201615055031 申请日期 2016.02.26
申请人 International Business Machines Corporation 发明人 Berry Christopher J.;Nigaglioni Ricardo H.;Qian Haifeng;Saha Sourav
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
主权项 1. A computer implemented method for cross-hierarchy interconnect adjustment, the method comprising: determining a chip layout data corresponding to a chip design the chip layout data comprising a plurality of chip components, a first hierarchy comprising a first subset of the plurality of chip components, and a second hierarchy comprising a second subset of the plurality of chip components, wherein a first portion of a metal stack of the chip design is assigned to the first hierarchy and a second portion of the metal stack is assigned to the second hierarchy based on a contract between the first hierarchy and the second hierarchy; receiving chip layout data and placing the plurality of chip components based on the first hierarchy, the second hierarchy and the contract; assigning higher-level metal resources to a parent hierarchy and lower-level metal resources to the first hierarchy and second hierarchy, the higher-level metal resources having a first RC value and the lower-level metal resources having a second RC value, the second RC value being larger than the first RC value; determining an unused portion of the first portion of the metal stack; moving an interconnect of the second hierarchy from the second portion of the metal stack that is assigned to the second hierarchy to the unused portion of the first portion of the metal stack in the chip layout data, the movement of the interconnect being based on an RC value, slack, congestion, interconnect length and load profile; and performing power recovery on the chip layout data after moving the interconnect based on an amount of slack margin generated in the chip design by the moving of the interconnect; and fabricating a physical chip based on the chip layout data after performing the power recovery.
地址 Armonk NY US