发明名称 MOVABLE SUPPORT AND LITHOGRAPHIC APPARATUS
摘要 The present invention relates to a movable support (1) configured to support an object, comprising: a support plane (2) to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly comprises: a first actuator (3) configured to exert a first actuation force (F1) in a first actuation direction (A1), said first actuation direction being parallel to the support plane, a second actuator (4) configured to exert a second actuation force (F2) in a second actuation direction (A2), said second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.
申请公布号 WO2017005387(A1) 申请公布日期 2017.01.12
申请号 WO2016EP59508 申请日期 2016.04.28
申请人 ASML NETHERLANDS B.V. 发明人 DE GROOT, Antonius, Franciscus, Johannes;RUIJL, Theo, Anjes, Maria;VALENTIN, Christiaan, Louis
分类号 G03F7/20;H01L21/68;H02P25/08 主分类号 G03F7/20
代理机构 代理人
主权项
地址