| 摘要 |
An imaging optic for projection lithography has a plurality of imaging optical components. An object field (4) has an edge contour. In a transverse direction to an object scanning direction (y), this edge contour has a leading object-field edge contour section (4IN) and a following object edge contour section (4ουτ). Correspondingly, the image field (8) also has a leading image-field edge contour section (8IN) and a following image-field edge contour section (8ουτ). In a first variation, an object-field edge contour radius (RIN 4) is finite and a ratio (RIN 4/RIN 8) of the object-field edge contour radius (RIN 4) and the image-field edge contour radius (RIN 8) deviates from an imaging standard (ß) by more than 10%. In a further variation, the object-field edge contour radius (RIN 4) is infinite and the image-filed edge contour radius (RIN 8) is finite. As a result, an imaging optic having improved imaging quality is produced. |
