| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus for processing a substrate by using a process liquid, which achieves inhibition of particles from being generated and collection of the process liquid while downsizing a chamber.SOLUTION: A substrate processing apparatus comprises a chamber 12 having a chamber lid part 122 which is moved up and down. In a state where the chamber lid part 122 and a cup part 161 are located at high positions in contact with each other, a medicinal solution is discharged on a substrate 9 and the medicinal solution is collected by the cup part 161. In a state where the chamber lid part 122 and the cup part 161 are located at low positions in contact with each other, pure water is discharged on the substrate 9 and solution is collected by the chamber 12. An inner peripheral part of the chamber lid part 122 includes a downward projection 31 which projects downward. The downward projection covers the inside of a gap between the chamber lid part 122 and a chamber body 121 in a radial direction. This inhibits a process liquid from entering the gap to become a generation source of particles. Since the process liquid is received by the chamber lid part 122, the chamber 12 can be downsized. |
