| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a structure for individual authentication, which is a fine artificial product having cloning resistance.SOLUTION: A structure for individual authentication 1 is produced by applying a chemical ray-sensitive resist on a substrate 2 to form a resist layer 11, irradiating a desired portion of the resist layer 11 with chemical rays, and developing the resist layer 11 to form a resist structure 3 on the substrate 2. In the formation of the resist structure 3, external force is imparted to at least a part of a resist pattern 5 formed by developing the resist layer 11 so as to form one or more pattern aggregates 6. |
