发明名称 |
Method of fabricating polarizing member, and method of fabricating liquid crystal display including polarizing member |
摘要 |
A method of fabricating a polarizing member includes: sequentially disposing a metal layer and a preliminary pattern layer on a base substrate including a display area and a non-display area; forming a patterned resin layer on the preliminary pattern layer in the display area, the patterned resin layer including patterns formed on a surface of the patterned resin layer; surface-treating the preliminary pattern layer and the patterned resin layer; forming a mask pattern including a photoresist material on the preliminary pattern layer disposed in the non-display area; forming preliminary patterns on the preliminary pattern layer using the patterned resin layer; and forming a wire grid polarizing unit in the display area by etching the metal layer using the preliminary pattern and the mask pattern as a polarizing pattern. |
申请公布号 |
US9541789(B2) |
申请公布日期 |
2017.01.10 |
申请号 |
US201514881937 |
申请日期 |
2015.10.13 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Jang Dae-Hwan;Han Kang-Soo;Nam Jung-Gun;Lee Dae-Young;Jo Gug-Rae |
分类号 |
H01L21/00;G02F1/1335;H01L27/12;G02B5/30;G03F7/16 |
主分类号 |
H01L21/00 |
代理机构 |
H.C. Park & Associates, PLC |
代理人 |
H.C. Park & Associates, PLC |
主权项 |
1. A method of fabricating a polarizing member, comprising:
sequentially disposing a metal layer and a preliminary pattern layer on a base substrate comprising a display area and a non-display area; forming a patterned resin layer on the preliminary pattern layer in the display area, the patterned resin layer comprising patterns formed on a surface of the patterned resin layer; surface-treating the preliminary pattern layer and the patterned resin layer; forming a mask pattern comprising a photoresist material on the preliminary pattern layer disposed in the non-display area; forming preliminary patterns on the preliminary pattern layer using the patterned resin layer; and forming a wire grid polarizing unit in the display area by etching the metal layer using the preliminary pattern and the mask pattern as a polarizing pattern. |
地址 |
Yongin-si KR |