发明名称 Semiconductor switching device including charge storage structure
摘要 A semiconductor switching device includes a first load terminal electrically connected to source zones of transistor cells. The source zones form first pn junctions with body zones. A second load terminal is electrically connected to a drain construction that forms second pn junctions with the body zones. Control structures, which include a control electrode and charge storage structures, directly adjoin the body zones. The control electrode controls a load current through the body zones. The charge storage structures insulate the control electrode from the body zones and contain a control charge adapted to induce inversion channels in the body zones in the absence of a potential difference between the control electrode and the first load electrode.
申请公布号 US9543398(B2) 申请公布日期 2017.01.10
申请号 US201514814758 申请日期 2015.07.31
申请人 Infineon Technologies AG 发明人 Laven Johannes Georg;Mauder Anton;Dainese Matteo;Hirler Franz;Jaeger Christian;Roesch Maximilian;Roesner Wolfgang;Stiftinger Martin;Strenz Robert
分类号 H01L29/423;H01L27/02;H01L27/06;H01L27/115;H01L29/792;H01L21/28;H01L29/788 主分类号 H01L29/423
代理机构 Eschweiler & Associates, LLC 代理人 Eschweiler & Associates, LLC
主权项 1. A semiconductor device, comprising: a first load terminal electrically connected to source zones of transistor cells, wherein the source zones form first pn junctions with body zones; a second load terminal electrically connected to a drain construction forming second pn junctions with the body zones; and control structures directly adjoining the body zones, the control structures comprising a control electrode and charge storage structures, the control electrode configured to control a load current through the body zones, the charge storage structures insulating the control electrode from the body zones and containing a control charge adapted to induce inversion channels in the body zones in the absence of a potential difference between the control electrode and the first load terminal, wherein the body zones are formed in semiconductor mesas formed from portions of a semiconductor body and separated from each other by the control structures.
地址 Neubiberg DE