| 发明名称 | Faceted EUV optical element | ||
| 摘要 | A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets. | ||
| 申请公布号 | US9541840(B2) | 申请公布日期 | 2017.01.10 |
| 申请号 | US201414575699 | 申请日期 | 2014.12.18 |
| 申请人 | ASML NETHERLANDS B.V. | 发明人 | Brandt David C.;Ershov Alexander I.;Fomenkov Igor V. |
| 分类号 | G03F7/20;G02B5/08;H05G2/00 | 主分类号 | G03F7/20 |
| 代理机构 | Arent Fox LLP | 代理人 | Arent Fox LLP |
| 主权项 | 1. An EUV light source comprising: a reflective EUV optic comprising a first facet comprising a first portion of a reflective surface of the reflective EUV optic and a second facet comprising a second portion of the reflective surface of the reflective EUV optic, the first facet being separated from the second facet by a gap; and a gas supply in fluid communication with the gap. | ||
| 地址 | Veldhoven NL | ||