发明名称 |
Field effect transistor with integrated Zener diode |
摘要 |
One or more Zener diodes and a field effect transistor having a drain connected in series with the one or more Zener diodes are integrally formed by a plurality of doped regions in the same P-type semiconductor substrate and separated by a punch through stop region. An N-type region is formed under the one or more Zener diodes. |
申请公布号 |
US9543292(B2) |
申请公布日期 |
2017.01.10 |
申请号 |
US201514633833 |
申请日期 |
2015.02.27 |
申请人 |
ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED |
发明人 |
Tsuchiko Hideaki |
分类号 |
H01L27/06;H01L21/8232;H01L29/06;H01L29/08;H01L29/808;H01L29/866 |
主分类号 |
H01L27/06 |
代理机构 |
JDI Patent |
代理人 |
Isenberg Joshua D.;JDI Patent |
主权项 |
1. A device, comprising:
one or more Zener diodes; and a field effect transistor having a drain connected in series with the one or more Zener diodes; wherein the one or more Zener diodes and field effect transistor are formed by a plurality of doped regions on a common P-type semiconductor substrate and separated by a punch through stop region; and an N-type region formed under the one or more Zener diodes configured to stop punch through from a P-well or P-body region of the Zener diode to the common P-type semiconductor substrate, wherein the one or more Zener diodes include an N-type region formed in the common P-type substrate and a P-type region formed in a layer of the P-type substrate adjacent the N-type region. |
地址 |
Sunnyvale CA US |