发明名称 Field effect transistor with integrated Zener diode
摘要 One or more Zener diodes and a field effect transistor having a drain connected in series with the one or more Zener diodes are integrally formed by a plurality of doped regions in the same P-type semiconductor substrate and separated by a punch through stop region. An N-type region is formed under the one or more Zener diodes.
申请公布号 US9543292(B2) 申请公布日期 2017.01.10
申请号 US201514633833 申请日期 2015.02.27
申请人 ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED 发明人 Tsuchiko Hideaki
分类号 H01L27/06;H01L21/8232;H01L29/06;H01L29/08;H01L29/808;H01L29/866 主分类号 H01L27/06
代理机构 JDI Patent 代理人 Isenberg Joshua D.;JDI Patent
主权项 1. A device, comprising: one or more Zener diodes; and a field effect transistor having a drain connected in series with the one or more Zener diodes; wherein the one or more Zener diodes and field effect transistor are formed by a plurality of doped regions on a common P-type semiconductor substrate and separated by a punch through stop region; and an N-type region formed under the one or more Zener diodes configured to stop punch through from a P-well or P-body region of the Zener diode to the common P-type semiconductor substrate, wherein the one or more Zener diodes include an N-type region formed in the common P-type substrate and a P-type region formed in a layer of the P-type substrate adjacent the N-type region.
地址 Sunnyvale CA US