| 发明名称 |
Bipolar Plate and Layer Structure on the Bipolar Plate |
| 摘要 |
A bipolar plate, has a base area and raised structures provided thereon. The raised structures each have a first region and a second region. The first region is designed to penetrate into a gas diffusion layer that is to be brought into contact with the bipolar plate and to increase the contact area between the bipolar plate and the gas diffusion layer. The second region is between the base area of the bipolar plate and the first region of the raised structures. The first region and/or the second region is/are of such a form and/or arrangement that the base area of the bipolar plate and the gas diffusion layer are kept apart. |
| 申请公布号 |
US2017005344(A1) |
申请公布日期 |
2017.01.05 |
| 申请号 |
US201615267274 |
申请日期 |
2016.09.16 |
| 申请人 |
Bayerische Motoren Werke Aktiengesellschaft |
发明人 |
SCHMID Johannes;HAASE Stefan |
| 分类号 |
H01M8/0228;H01M8/0245;H01M4/88;H01M4/86;H01M4/94 |
主分类号 |
H01M8/0228 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A bipolar plate, comprising:
a base area; and raised structures provided on the base area, wherein the raised structures each comprise a first region, which is designed to penetrate into a gas diffusion layer to be brought into contact with the bipolar plate and to increase a contact area between the bipolar plate and the gas diffusion layer, and a second region, which is present between the base area of the bipolar plate and the first region of the raised structures, and the first region and/or the second region are formed and/or arranged to keep the base area of the bipolar plate and the gas diffusion layer at a spacing (X). |
| 地址 |
Muenchen DE |
