VACUUM VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD

摘要

A vacuum vapor deposition apparatus comprises: a vacuum chamber (1), and a rotating base (8), a vapor source (5), and a plurality of vapor-deposited regions that are sequentially arranged in the vacuum chamber (1) from bottom to top. The shape of the rotating base (8) is a Reuleaux triangle, and a moving track of the vertex of the rotating base (8) on the horizontal plane is a rounded square. The vapor-deposited regions are arranged at spaced intervals along the moving track of the vertex of the rotating base (8). The vapor source is driven by the rotating base (8) to sequentially pass through regions below the vapor-deposited regions, so that vapor deposition operations can be simultaneously performed in a plurality of directions by using the vapor source (5). A vapor deposition method using the vapor deposition apparatus is also provided.