发明名称 PHOTOINITIATOR AND PHOTOSENSITIVE COMPOSITION INCLUDING THE SAME
摘要 Provided is a photoinitiator represented by Formula 1:;;The photoinitiator is suitable for photocrosslinking. Further provided is a photosensitive resin composition including the photoinitiator. The photoinitiator and the photosensitive resin composition have improved solubility and high sensitivity. The photosensitive resin composition is suitable for use in the production of black resists, color resists, overcoats, column spacers, and organic insulating films for LCDs.
申请公布号 US2017003589(A1) 申请公布日期 2017.01.05
申请号 US201415100305 申请日期 2014.11.27
申请人 TAKOMA TECHNOLOGY CO., LTD. 发明人 YOO Mi Sun;SONG Bok Joo
分类号 G03F7/031;C07D409/06;C07D209/86 主分类号 G03F7/031
代理机构 代理人
主权项 1. A photoinitiator represented by Formula 1: wherein R1 is a C1-C12 linear, branched or cyclic alkyl group optionally containing oxygen, sulfur, nitrogen or an ester bond in the chain, R2 is a C1-C6 alkyl group; a C6-C20 aryl group optionally substituted with oxygen, sulfur, nitrogen, a C1-C3 alkyl group, a nitro group or a halogen atom; a 2-methylbenzyl group;(n=1-4), R3 is a C1-C10 linear, branched or cyclic alkyl group, a C6-C20 aryl group, or a C4-C20 heteroaryl group, R4 is a C1-C10 linear, branched or cyclic alkyl group or a phenyl group, and x is 0 or 1.
地址 Nonsan KR