发明名称 |
Semiconductor Device Including a Contact Structure Directly Adjoining a Mesa Section and a Field Electrode |
摘要 |
A semiconductor device includes a gate structure that extends from a first surface into a semiconductor portion and that surrounds a transistor section of the semiconductor portion. A field plate structure includes a field electrode and extends from the first surface into the transistor section. A mesa section of the semiconductor portion separates the field plate structure and the gate structure. A contact structure includes a first portion directly adjoining the mesa section and a second portion directly adjoining the field electrode. The first and second portions include stripes and are directly connected to each other. |
申请公布号 |
US2017005171(A1) |
申请公布日期 |
2017.01.05 |
申请号 |
US201615201017 |
申请日期 |
2016.07.01 |
申请人 |
Infineon Technologies Austria AG |
发明人 |
Laforet David;Schwarz Elisabeth;Weissnicht Beate |
分类号 |
H01L29/40;H01L23/58;H01L29/10;H01L29/739;H01L29/861 |
主分类号 |
H01L29/40 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device, comprising:
a gate structure extending from a first surface into a semiconductor portion and surrounding a transistor section of the semiconductor portion; a field plate structure extending from the first surface into the transistor section and comprising a field electrode; a mesa section of the semiconductor portion separating the field plate structure and the gate structure; and a contact structure comprising a first portion directly adjoining the mesa section and a second portion directly adjoining the field electrode, wherein the first and second portions include stripes and are directly connected to each other. |
地址 |
Villach AT |