发明名称 |
Semiconductor device and related fabrication method |
摘要 |
Embodiments of the invention provide a semiconductor device and a related method of fabricating a semiconductor device. In one embodiment, the invention provides a semiconductor device comprising a first gate electrode comprising a lower silicon pattern and an upper silicon pattern and disposed on an active region of a semiconductor substrate, wherein the upper silicon pattern has the same crystal structure as the lower silicon pattern and the active region is defined by a device isolation layer. The semiconductor device further comprises a gate insulating layer disposed between the active region and the first gate electrode.
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申请公布号 |
US2007190726(A1) |
申请公布日期 |
2007.08.16 |
申请号 |
US20070699990 |
申请日期 |
2007.01.31 |
申请人 |
SONG JAI-HYUK;CHOI JEONG-HYUK;LEE WOON-KYUNG |
发明人 |
SONG JAI-HYUK;CHOI JEONG-HYUK;LEE WOON-KYUNG |
分类号 |
H01L21/336 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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