| 摘要 |
The invention relates to a method of modifying a sample surface layer from a sample (120) in a particle-optical apparatus (100) such as an electron microscope, the method performed in vacuum, the method comprising the steps of:
€¢ Providing the microscopic sample (120) attached to a manipulator (116),
€¢ Providing a first liquid (122A) at a first (controlled) temperature,
€¢ Dipping the sample in the first liquid, thereby causing a sample surface modification,
€¢ Removing the sample from the first liquid,
€¢ Providing a second liquid (122B) at a second (controlled) temperature,
€¢ Dipping the sample in the second liquid, and
€¢ Removing the sample from the second liquid. This enables the wet processing of a sample in-situ, thereby enhancing speed and/or avoiding subsequent alteration/contamination of the sample, such as oxidation, etc. The method is particularly useful for etching a lamella after machining the lamella with a (gallium) FIB to remove the surface layer where gallium implantation occurred, or where the crystal lattice is disturbed. |
