Developing apparatus and developing method

摘要

According to one embodiment, a developing apparatus and method comprises moving a first nozzle from a scan start position to a scan end position, with holding a second nozzle for supplying a rinse solution to be adjacent to the scan start position for the first nozzle, while supplying a developing solution from the first nozzle onto a wafer being rotated; and supplying the rinse solution from the second nozzle onto the wafer being rotated.

主权项

1. A developing apparatus comprising:
a wafer holder to hold a wafer; a rotating unit that rotates the wafer holder; a first nozzle to supply a developing solution onto the wafer; a second nozzle to supply a rinse solution onto the wafer; a nozzle guide that guides the first nozzle so as to be able to linearly scan directly above the wafer while holding the second nozzle in a position directly above the wafer to be adjacent to a scan start position for the first nozzle; a first nozzle driver that drives the first nozzle while having the nozzle guide lead the first nozzle; and a first nozzle drive control unit that drives and controls the first nozzle to move from the scan start position to a scan end position while supplying the developing solution onto the wafer.