Microlithographic projection exposure apparatus

摘要

A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

主权项

1. An optical system, comprising:
a mirror array, comprising:
a base body;a plurality of mirror units supported by the base body, each mirror unit comprising:
a mirror; anda solid-state articulation comprising first and second articulation parts, each articulation part connecting the mirror to the base body, each articulation part being capable of bending in a plane of bending, and each articulation part being subdivided into a plurality of articulation elements that are spaced apart from each other in the plane of bending to reduce a flexural stiffness of the at least two articulation parts; and a control device configured to modify an orientation of the mirror relative to the base body, wherein the optical system is a projection objective of a microlithographic projection exposure apparatus or an illumination system of a microlithographic projection exposure apparatus.