发明名称 消失模型用塗型剤組成物
摘要 This coating agent composition for evaporative patterns contains a refractory aggregate and a cellulose, and the cellulose is contained in an amount of 1-10 parts by mass per 100 parts by mass of the refractory aggregate. The present invention is able to provide a coating agent composition for evaporative patterns, which is highly safe and is capable of further suppressing residual defects.
申请公布号 JP6037977(B2) 申请公布日期 2016.12.07
申请号 JP20130174577 申请日期 2013.08.26
申请人 花王株式会社 发明人 酒井 祐之;田中 勉
分类号 B22C3/00;B22C9/04 主分类号 B22C3/00
代理机构 代理人
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