发明名称 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 Within an area (A 0 ) where of four heads (60 1 to 60 4 ) installed on a stage (WST1), heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the stage (WST1) is driven based on positional information which is obtained using the first head group, as well as obtaining the displacement (displacement of position, rotation, and scaling) between the first and second reference coordinate systems (C 1 , C 2 ) corresponding to the first and second head groups using the positional information obtained using the first and second head groups. By using the results and correcting measurement results obtained using the second head group, the displacement between the first and second reference coordinate systems (C 1 , C 2 ) is calibrated, which allows the measurement errors that come with the displacement between the areas on the scale plates where each of the four heads (60 1 to 60 4 ) face to be corrected.
申请公布号 EP3098655(A2) 申请公布日期 2016.11.30
申请号 EP20160166162 申请日期 2010.08.24
申请人 NIKON CORPORATION 发明人 SHIBAZAKI, YUICHI
分类号 G03F7/20 主分类号 G03F7/20
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