| 摘要 |
PROBLEM TO BE SOLVED: To provide an abrasive for tungsten that can reduce erosion while maintaining an excellent polishing rate on a tungsten material.SOLUTION: An abrasive for tungsten comprises an abrasive grain, an oxidizing agent, and a polysaccharide having a structural unit represented by the formula (I): CHO, where the polysaccharide has a weight average molecular weight of 5,000-250,000, and a content of the polysaccharide is 0.1-2.0 mass% based on the total mass of the abrasive.SELECTED DRAWING: None |
