发明名称 |
バナジン酸ビスマス積層体の製造方法及びバナジン酸ビスマス積層体 |
摘要 |
A new BiVO 4 -laminate manufacturing method and BiVO 4 laminate are provided. A bismuth-vanadate laminate is manufactured as follows: a substrate that can be heated by microwaves is disposed inside a precursor solution containing a vanadium salt and a bismuth salt, microwave-activated chemical bath deposition (MW-CBD) is used to form a bismuth-vanadate layer on the substrate, and a firing process is performed as necessary. A bismuth-vanadate laminate manufactured in this way is suitable for use as a photocatalyst or photoelectrode. |
申请公布号 |
JP6021086(B2) |
申请公布日期 |
2016.11.02 |
申请号 |
JP20150504331 |
申请日期 |
2014.03.04 |
申请人 |
学校法人東京理科大学;三井化学株式会社;人工光合成化学プロセス技術研究組合 |
发明人 |
工藤 昭彦;ジア チンシン;岩瀬 顕秀 |
分类号 |
C01G31/00;B01J23/22;B01J35/02;B01J37/02;B01J37/34 |
主分类号 |
C01G31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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