USE OF NON-OXIDIZING STRONG ACIDS FOR THE REMOVAL OF ION-IMPLANTED RESIST
摘要
A method and composition for removing bulk and/or ion-implanted resist material from microelectronic devices have been developed. The compositions effectively remove the ion-implanted resist material while not damaging the silicon-containing or germanium-containing materials.
申请公布号
EP3084809(A1)
申请公布日期
2016.10.26
申请号
EP20140873036
申请日期
2014.12.19
申请人
ENTEGRIS, INC.;ATMI KOREA CO., LTD.
发明人
BILODEAU, STEVEN;COOPER, EMANUEL I.;LEE, JAESEOK;KIM, WONLAE;BARNES, JEFFREY A.
