| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition capable of obtaining a resist pattern having excellent line edge roughness, and a resin contained in the resist composition.SOLUTION: The present invention discloses the resin having a structural unit expressed by Formula (I), and the resist composition containing the resin. In the Formula, Rrepresents a 1-6C alkyl group which may have a halogen atom, hydrogen atom, or a halogen atom, Arepresents a single bond,-A-O-,-A-CO-O-,-A-CO-O-A-CO-O-, or-A-O-CO-A-O-, * represents a coupling bond to -O-, and Aand Arepresent respectively independently 1-6C alkylene groups. |
