| 摘要 |
A method for producing a ZnO based semiconductor element comprises the steps of (a) forming an n-type ZnO based semiconductor layer, (b) forming a ZnO based semiconductor active layer above the n-type ZnO based semiconductor layer, (c) forming a first p-type ZnO based semiconductor layer above the ZnO based semiconductor active layer, and (d) forming a second p-type ZnO based semiconductor layer above the first p-type ZnO based semiconductor layer, wherein the step (d) comprises the steps of (d1) forming an n-type Mg x Zn 1-x O film having a Group 11 element supplied on its surface and doped with a Group 13 element, and (d2) annealing the n-type Mg x Zn 1-x O film for conversion into a p-type film doped with the 11 element, and the first p-type ZnO based semiconductor layer doped an element which reduces diffusion of the Group 11 element and the Group 13 element is formed in the step (c). |
