EXPOSURE APPARATUS, SUBSTRATE PROCESSING APPARATUS, EXPOSURE METHOD OF SUBSTRATE, AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of exposing a film formed on one surface of a substrate with preliminarily determined exposure luminous energy, a substrate processing apparatus, an exposure method and a substrate processing method.SOLUTION: A local conveyance hand 434 is configured to be movable in front-rear directions between a rear position P1 behind a light-emitting part 300 and a front position P2 ahead of the light-emitting part 300. A substrate W having a DSA (directed self assembly) film formed thereon is mounted on an upper surface of the local conveyance hand 434. Vacuum ultraviolet rays UV having a strip-like cross section is emitted from the light-emitting part 300 to cross a travelling path of the local conveyance hand 434. The local conveyance hand 434 travels from the front position P2 to the rear position P1 so as to irradiate the DSA film on the substrate W with the vacuum ultraviolet rays UV emitted by the light-emitting part 300. In this stage, the travelling speed of the substrate W is controlled to adjust the exposure luminous energy given to the DSA film formed on the substrate W.SELECTED DRAWING: Figure 21